| Catalog Number |
ACMA00038743 |
| Description |
• Excellent chemical resistance
• No concern of contamination due to the elution.
• Stirring of chemicals and cleaning can be effectively performed by generating the fine bubbles.
• Made to order.
• Bubble diameter (2 µm), Bubbling rate (34%) |
| Application |
• Cleaning of wafer in the semiconductor manufacturing process
• Absorption reaction process of carbon dioxide/chlorine gas
• Stirring chemicals |
| Elongation At Break |
0.4 |
| Hardness |
Shore D 46 |
| Material |
PTFE |
| Surface Roughness |
27, Rmax |
| Tensile Strength |
6 MPa |
| Thickness |
< 20 mm |
| Working Temperature |
+100℃ |
If you have any other questions or need other size, please get a quote.
※ Please kindly note that our products are for research use only.
