| Catalog Number |
ACM101947164-7 |
| CAS |
101947-16-4 |
| Structure |
 |
| Description |
97% |
| Synonyms |
Triethoxy-1H,1H,2H,2H-heptadecafluorodecylsilane |
| IUPAC Name |
Triethoxy(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl)silane |
| Molecular Weight |
610.38 |
| Molecular Formula |
C16H19F17O3Si |
| Canonical SMILES |
CCO[Si](CCC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(OCC)OCC |
| InChI |
InChI=1S/C16H19F17O3Si/c1-4-34-37(35-5-2,36-6-3)8-7-9(17,18)10(19,20)11(21,22)12(23,24)13(25,26)14(27,28)15(29,30)16(31,32)33/h4-8H2,1-3H3 |
| InChI Key |
MLXDKRSDUJLNAB-UHFFFAOYSA-N |
| Boiling Point |
209-230 °C |
| Flash Point |
>230 °F |
| Purity |
95%+ |
| Density |
1.389 g/mL at 25 °C (lit.) |
| Solubility |
Miscible with ethanol and tetrahydrofuran |
| Appearance |
Colourless liquid |
| Application |
1H,1H,2H,2H-Perfluorodecyltriethoxysilane serves multiple innovative purposes across a range of industries, leveraging its unique chemical structure to offer specialized functionalities. The product plays a crucial role in the fabrication of thin film transistors, polyethersulfone membranes, and superwettable Janus membranes. It's also utilized in bonding poly(tetrafluoroethylene) films to silicon wafers, contributing to advancements in anti-reflective, release, and soil repellent coatings. In the realm of consumer electronics, it acts as an effective anti-fingerprint agent for high-end mobile phone screens and camera lenses. Its hydrophobic properties make it valuable for functionalizing ceramic membranes with nanosized pores and enhancing the water resistance of Cu2(OH)3NO3 crystals. Additionally, 1H,1H,2H,2H-Perfluorodecyltriethoxysilane is used in the medical field to coat nanosized devices and protect metal surfaces from fouling. Its scalable application as a superamphiphobic spray coating on stainless steel holds potential for creating surfaces resistant to icing and stains. Furthermore, it modifies the surface of poly(methyl methacrylate) for the development of microfluidic chips, demonstrating its versatility and broad applicability. |
| Storage |
Under inert gas (nitrogen or Argon) at 2-8 °C |
| Form |
liquid |
| Refractive Index |
1.342 |
| Unit Size |
25 G |
| Vapor Pressure |
0.00187 mmHg at 25°C |
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